Pang Huiqing | Institute Of Microelectronics Tsinghua University
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概要
関連著者
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Pang Huiqing
Institute Of Microelectronics Tsinghua University
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Zhu Jun
Institute Of Forensic Science Ministry Of Public Security
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Pan Liyang
Institute Of Microelectronics Tsinghua University
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Sun Lei
Institute Of Microelectronics Peking University
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ZHU Jun
Institute of Forensic Science, Ministry of Public Security
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Zhu Jun
Institute Of Microelectronics Tsinghua University
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Sun Lei
Institute Of Microelectronics Tsinghua University
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PAN Liyang
Institute of Microelectronics, Tsinghua University
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Zeng Ying
Institute Of Microelectronics Tsinghua University
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Zhang Zhaojian
Institute Of Microelectronics Tsinghua University
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ZENG Ying
Institute of Microelectronics, Tsinghua University
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ZHANG Zhaojian
Institute of Microelectronics, Tsinghua University
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CHEN John
Semiconductor Manufacturing International Corporation
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WANG Jimin
Institute of Microelectronics, Tsinghua University
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LI Xiyou
Institute of Microelectronics, Tsinghua University
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Li Xiyou
Institute Of Microelectronics Tsinghua University
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Wang Jimin
Institute Of Microelectronics Tsinghua University
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Wu Dong
Institute Of Microelectronics Tsinghua University
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Zhang Zhaojian
Institute of Microelectronics, Tsinghua University, Beijing 100084, P. R. China
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Sun Lei
Institute of Microelectronics, Tsinghua University, Beijing 100084, P. R. China
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Zhu Jun
Institute of Microelectronics, Tsinghua University, Beijing 100084, P. R. China
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Chen John
Semiconductor Manufacturing International Corporation, Shanghai 201203, P. R. China
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Pan Liyang
Institute of Microelectronics, Tsinghua University, Beijing 100084, P. R. China
著作論文
- Lateral Redistribution and Interactive Impacts of Localized Trapped Charges during Retention Baking in SONOS Memory
- Characteristics of Band-to-Band Tunneling Hot Hole Injection for Erasing Operation in Charge-Trapping Memory (Special Issue: Solid State Devices & Materials)
- Characteristics of Band-to-Band Hot Hole Injection for Erasing Operation in Charge Trapping Memory
- Distribution and Impact of Local Trapped Charges in Silicon-Oxide-Nitride-Oxide-Silicon (SONOS) Memory
- Distribution and Impact of Local Trapped Charges in SONOS Memory
- Characteristics of Band-to-Band Tunneling Hot Hole Injection for Erasing Operation in Charge-Trapping Memory