YAMAUCHI Hiroshi | New Industry Creation Hatchery Center, Tohoku University
スポンサーリンク
概要
関連著者
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Goto Tetsuya
New Industry Creation Hatchery Center Tohoku University
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YAMAUCHI Hiroshi
New Industry Creation Hatchery Center, Tohoku University
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SUGAWA Shigetoshi
Graduate School of Engineering, Tohoku University
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OHMI Tadahiro
New Industry Creation Hatchery Center, Tohoku University
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HIRAYAMA Masaki
New Industry Creation Hatchery Center, Tohoku University
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Sugawa Shigetoshi
Graduate School Of Engineering Tohoku University
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Hirayama Masaki
New Industry Creation Hatchery Center Tohoku University
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Moriguchi Makoto
New Industry Creation Hatchery Center Tohoku University
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TERASAKI Masato
Graduate School of Engineering, Tohoku University
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Ohmi Tadahiro
New Industry Creation Hatchery Center (niche) Tohoku University
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Goto Tetsuya
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
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TERAMOTO Akinobu
New Industry Creation Hatchery Center, Tohoku University
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Sugawa S
Graduate School Of Engineering Tohoku University
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Ohmi T
New Industry Creation Hatchery Center Tohoku University
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Yamauchi Hiroshi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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KATO Takeyoshi
New Industry Creation Hatchery Center, Tohoku University
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Kato Takeyoshi
New Industry Creation Hatchery Center Tohoku University
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Teramoto Akinobu
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
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Teramoto Akinobu
New Industry Creation Hatchery Center (NICHe), Tohoku University, Sendai 980-8579, Japan
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Hirayama Masaki
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
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Terasaki Masato
Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
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Sugawa Shigetoshi
Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
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Moriguchi Makoto
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
著作論文
- High-Speed Damage-Free Contact Hole Etching Using Dual Shower Head Microwave-Excited High-Density-Plasma Equipment
- A New Microwave-Excited Plasma Etching Equipment for Separating Plasma Excited Region from Etching Process Region
- A New Microwave-Excited Plasma Etching Equipment for Separating Plasma Excited Region from Etching Process Region
- High-Speed Damage-Free Contact Hole Etching Using Dual Shower Head Microwave-Excited High-Density-Plasma Equipment