Lee Jeong-youb | Memory R&d Division Hynix Semiconductor Inc.
スポンサーリンク
概要
関連著者
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Cho Heung-jae
Memory R&d Division Hynix Semiconductor Inc.
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Lim Kwan-yong
Memory R&d Division Hynix Semiconductor Inc.
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Park Dae-gyu
Memory R&d Division Hynix Semiconductor Inc.
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Roh Jae-sung
Memory R&d Division Hynix Semiconductor Inc.
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Lee Jeong-youb
Memory R&d Division Hynix Semiconductor Inc.
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Yeo I‐s
Hynix Semiconductor Inc. Kyoungki Kor
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Yeo In-seok
Memory R&d Division Hyundai Electronics Industries Co.ltd.
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Roh Jae-sung
Memory Research And Development Division Hynix Semiconductor Inc.
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LEE Jeong-Youb
Memory R&D Division, Hynix Semiconductor Inc.
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LEE Jung-Ho
Memory R&D Division, Hynix Semiconductor Inc.
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Yeo In-seok
Memory R&d Division Hynix Semiconductor Inc.
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Lee Jung-ho
Memory R&d Division Hynix Semiconductor Inc.
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Lee J‐h
Memory R&d Division Hynix Semiconductor Inc.
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Roh J‐s
Memory Research And Development Division Hynix Semiconductor Inc.
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Lee Jeong-Youb
Memory R&D Division, Hynix Semiconductor Inc., Ichon P.O. Box 1010, Ichon-si, Kyoungki-do 467-701, Korea
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Roh Jae-Sung
Memory R&D Division, Hynix Semiconductor Inc., Ichon P.O. Box 1010, Ichon-si, Kyoungki-do 467-701, Korea
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Lee Jung-Ho
Memory R&D Division, Hynix Semiconductor Inc., Ichon P.O. Box 1010, Ichon-si, Kyoungki-do 467-701, Korea
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Yeo In-Seok
Memory R&D Division, Hynix Semiconductor Inc., Ichon P.O. Box 1010, Ichon-si, Kyoungki-do 467-701, Korea
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Park Dae-Gyu
Memory R&D Division, Hynix Semiconductor Inc., Ichon P.O. Box 1010, Ichon-si, Kyoungki-do 467-701, Korea
著作論文
- Characteristics of Multiple Thickness Gate Oxides Using Oxidation Enhancement by Si Implantation
- Characteristics of Multiple Thickness Gate Oxides Using Oxidation Enhancement by Si Implantation