YOSHIOKA Ken | Kasado Design Department, Semiconductor Equipment Product Division, Semiconductor Manufacturing Equi
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概要
- 同名の論文著者
- Kasado Design Department, Semiconductor Equipment Product Division, Semiconductor Manufacturing Equiの論文著者
関連著者
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YOSHIOKA Ken
Kasado Design Department, Semiconductor Equipment Product Division, Semiconductor Manufacturing Equi
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Tamura H
R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.
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Watanabe S
Univ. Tokyo Tokyo Jpn
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YOSHIOKA Ken
Kanagawa Indnsteial Technolgy Research Institute
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Watanabe S
R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.
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Watanabe S
Division Of Materials Science Graduate School Of Engineering Hokkaido University
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Watanabe Seiichi
R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.
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Kanai Saburo
Kasado Division Hitachi High-technologies Corporation
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Yoshioka K
Kasado Design Department Semiconductor Equipment Product Division Semiconductor Manufacturing Equipm
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Mise Nobuyuki
Mechanical Engineering Research Laboratory Hitachi Ltd.
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DOI Akira
Mechanical Engineering Research Laboratory, Hitachi, Ltd.
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Kanekiyo Tadamitsu
Kasado Division Hitachi High-technologies Corporation
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Edamura Manabu
Mechanical Engineering Research Laboratory Hitachi Ltd.
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Kazumi Hideyuki
Hitachi Research Laboratory Hitachi Ltd.
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Tamura H
Department Of Computer Science And Electronics Kyushu Institute Of Technology
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Tamura Hitomi
Network Design Research Center Kyushu Institute Of Technology
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Tamura Hitoshi
Mechanical Engineering Research Laboratory Hitachi Ltd.
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Tamura Hideki
Faculty Of Eng. Yamagata Univ.
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Sumiya M
R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.
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WATANABE Shigeya
Department of Engineering Physics, Faculty of Engineering, Kyoto University
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水谷 照吉
愛知工業大学電気工学科
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MIZUTANI Tatsumi
Kasado Works, Hitachi, Ltd.
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Mizutani T
Nagoya Univ. Nagoya‐shi Jpn
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Mizutani Takashi
Department Of Health Sciences Yamanashi Medical University
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SUMIYA Masahiro
R&D center, Kasado Administrative Division Power & Industrial Systems, Hitachi Ltd.
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TAMURA Hitoshi
R&D center, Kasado Administrative Division Power & Industrial Systems, Hitachi Ltd.
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WATANABE Seiichi
R&D center, Kasado Administrative Division Power & Industrial Systems, Hitachi Ltd.
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OMOTO Yutaka
R&D Center, Kasado Administrative Division, Power & Industrial Systems, Hitachi Ltd.
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MIZUTANI Tatsumi
R&D Center, Kasado Administrative Division, Power & Industrial Systems, Hitachi Ltd.
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WATANABE Seiichi
Kasado R&D Center, Power & Industrial Systems, Hitachi Ltd.
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SUMIYA Masahiro
Kasado R&D Center, Power & Industrial Systems, Hitachi Ltd.
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TAMURA Hitoshi
Mechanical Engineering Research Laboratory, Hitachi Ltd.
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TOKUNAGA Takafumi
Device Development Center, Hitachi Ltd.
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Doi A
Mechanical Engineering Research Laboratory Hitachi Ltd.
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Omoto Yutaka
R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.
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EDAMURA Manabu
Mechanical Engineering Research Laboratory, Hitachi, Ltd.
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NISHIO Ryoji
Kasado Division, Hitachi High-Technologies Corporation
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KANEKIYO Tadamitsu
Kasado Division, Hitachi High-Technologies Corporation
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KANNO Seiichiro
Mechanical Engineering Research Laboratory, Hitachi, Ltd.
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KAZUMI Hideyuki
Hitachi Research Laboratory, Hitachi, Ltd.
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Nishio R
Hitachi High‐technologies Corp. Yamaguchi Jpn
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Kanno S
Hitachi Ltd. Ibaraki Jpn
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Kanno Seiichiro
Mechanical Engineering Research Laboratory Hitachi Ltd.
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Nishio Ryoji
Kasado Division Hitachi High-technologies Corporation
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Tokunaga Takafumi
Device Development Center Hitachi Ltd.
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Mise Nobuyuki
Mechanical Engineering Research Laboratory, Hitachi, Ltd., 502 Kandatsu, Tsuchiura, Ibaraki 300-0013, Japan
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Yoshioka Ken
Kasado Division, Hitachi High-Technologies Corporation, 794 Higashi-Toyoi, Kudamatsu, Yamaguchi 744-0002, Japan
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Kazumi Hideyuki
Hitachi Research Laboratory, Hitachi, Ltd., 7-1-1 Omika-cho, Hitachi, Ibaraki 319-1292, Japan
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Doi Akira
Mechanical Engineering Research Laboratory, Hitachi, Ltd., 502 Kandatsu, Tsuchiura, Ibaraki 300-0013, Japan
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Kanai Saburo
Kasado Division, Hitachi High-Technologies Corporation, 794 Higashi-Toyoi, Kudamatsu, Yamaguchi 744-0002, Japan
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Nishio Ryoji
Kasado Division, Hitachi High-Technologies Corporation, 794 Higashi-Toyoi, Kudamatsu, Yamaguchi 744-0002, Japan
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Edamura Manabu
Mechanical Engineering Research Laboratory, Hitachi, Ltd., 502 Kandatsu, Tsuchiura, Ibaraki 300-0013, Japan
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Kanno Seiichiro
Mechanical Engineering Research Laboratory, Hitachi, Ltd., 502 Kandatsu, Tsuchiura, Ibaraki 300-0013, Japan
著作論文
- High-Frequency Measurements of Plasma Parameters in Electron Cyclotron Resonance Plasma Etchers(Nuclear Science, Plasmas, and Electric Discharges)
- Evaluation of Charge Passed through Gate-Oxide Films Using a Charging Damage Measurement Electrode
- A Novel Plasma Etching Tool with RF-Biased Faraday-Shield Technology : Chamber Surface Reaction Control in the Etching of Nonvolatile Materials
- A Novel Plasma Etching Tool with RF-Biased Faraday-Shield Technology: Chamber Surface Reaction Control in the Etching of Nonvolatile Materials