Lee Bo-young | R&d Center Lg Siltron Inc.
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概要
関連著者
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Lee Bo-young
R&d Center Lg Siltron Inc.
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Yoo H‐d
R&d Center Lg Siltron Inc.
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Kim Young-hun
R & D Center Lg Siltron Inc.
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Lee K‐s
Lg Siltron Inc. Kyungbuk Kor
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Kim Y‐h
R & D Center Lg Siltron Inc.
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LEE Bo-Young
R&D Center, LG Siltron Inc.
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Yoo Hak-Do
R&D Center, LG Siltron Inc.
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LEE Ki-Sang
R&D Center, LG Siltron Inc.
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KIM Young-Hun
R&D Center, LG Siltron Inc.
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Lee S‐h
Department Of Chemistry Kyungpook National University
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Kim Hyun-soo
韓国
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Kim Hyun-soo
Department Of Internal Medicine Chonnam National University Medical School
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Kim Hyun-soo
Optical Communication Devices Department Basic Research Laboratory Electronics And Telecommunication
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Kwon Oh-jong
Department Of Metallurgical Engineering Kyungpook National University
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Kim Hyun-soo
Lg Siltron Inc.
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Lee Sang-hak
Department Of Chemistry Kyungpook National University
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Cho W‐j
Electronics And Telecommunications Res. Inst. Daejon Kor
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Hong Byung-sub
Hynix Semiconductor Inc.
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Pyi Seung-ho
Hynix Semiconductor Inc.
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KIM Eun-Ha
R&D Center, LG Siltron Inc.
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LEE Ki-Sang
LG Siltron Inc.
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LEE Bo-Young
LG Siltron Inc.
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YOO Hak-Do
LG Siltron Inc.
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KOHI Chung-Geun
Hynix Semiconductor Inc.
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KIM Yil-Wook
Hynix Semiconductor Inc.
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CHUNG Hye-Young
R&D Center, LG Siltron Inc
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CHO Hyo-Yong
R&D Center, LG Siltron Inc
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CHO Won-Ju
Hyundai Electronics Co.
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Kim Eun-ha
R&d Center Lg Siltron Inc.
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Chung Hye-young
R & D Center Lg Siltron Inc.
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LEE Bo-Young
R & D Center, LG Siltron Inc.
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HWANG Don-Ha
R & D Center, LG Siltron Inc.
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Hwang Don-ha
R & D Center Lg Siltron Inc.
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Kim Young-Hum
R&D Center, LG Siltron Inc
著作論文
- Effects of Surface Roughness and Copper Contamination on the Oxide Breakdown of Silicon Wafer(Semiconductors)
- Observation of Micro-Oxygen Precipitates in the Vicinity of the Oxidation-Induced Stacking Fault Ring and Their Effects on Thin Gate Oxide Breakdown : Semiconductors
- Collection Efficiency of Metallic Contaminants on Si Wafer by Vapor-Phase Decomposition-Droplet Collection
- Gate-Oxide-Integrity Characteristics of Vacancy-rich Wafer Compared with Crystal-Orginated-Pits-free Wafer as a Function of Oxide Thickness
- Determination of Flow Pattern Defect Area by μ-Photoconductivity Decay Lifetime Measurement