Yoo Hak-Do | R&D Center, LG Siltron Inc.

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著作論文

Effects of Surface Roughness and Copper Contamination on the Oxide Breakdown of Silicon Wafer(Semiconductors)
Collection Efficiency of Metallic Contaminants on Si Wafer by Vapor-Phase Decomposition-Droplet Collection
Gate-Oxide-Integrity Characteristics of Vacancy-rich Wafer Compared with Crystal-Orginated-Pits-free Wafer as a Function of Oxide Thickness
Behavior of Thermally Induced Defects in Heavily Boron-Doped Silicon Crystals

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