Ohba Yasuo | Corporate Research And Development Center Toshiba Corporation
スポンサーリンク
概要
関連著者
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Ohba Yasuo
Corporate Research And Development Center Toshiba Corporation
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Kaneko Kei
Corporate Research & Development Center Toshiba Corporation
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Iida Susumu
Corporate Research And Development Center Toshiba Corporation
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Kaneko Kei
Corporate Research And Development Center Toshiba Corporation
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SATO Rie
Corporate Research & Development Center, Toshiba Corporation
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Sato Rie
Corporate Research And Development Center Toshiba Corporation
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IIDA Susumu
Corporate Research and Development Center, Toshiba Corporation
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KUSHIBE Mitsuhiro
Corporate Research and Development Center, Toshiba Corporation
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KATSUNO Hiroshi
Corporate Research and Development Center, Toshiba Corporation
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Nunoue Sinya
Corporate Research and Development Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 210-8582, Japan
著作論文
- Highly Efficient InGaN-Based 383-nm Ultraviolet Light-Emitting Diodes Fabricated on Sapphire Substrate Using High-Temperature-Grown AlN Buffer
- Room-Temperature CW Operation of GaN-Based Blue-Violet Laser Diodes Fabricated on Sapphire Substrate Using High-Temperature-Grown Single-Crystal AlN Buffer Layer
- Two-Dimensional Growth of AlN and GaN on Lattice-Relaxed Al_Ga_N Buffer Layers Prepared with High-Temperature-Grown AlN Buffer on Sapphire Substrates and Fabrication of Multiple-Quantum-Well Structures
- Mechanism for Reducing Dislocations at the Initial Stage of GaN Growth on Sapphire Substrates Using High-Temperature-Grown Single-Crystal AlN Buffer Layers : Semiconductors