IIDA Susumu | Corporate Research and Development Center, Toshiba Corporation

スポンサーリンク

概要

• 同名の論文著者
• Corporate Research and Development Center, Toshiba Corporationの論文著者

関連著者

• Ohba Yasuo

  Corporate Research And Development Center Toshiba Corporation

• IIDA Susumu

  Corporate Research and Development Center, Toshiba Corporation

• Iida Susumu

  Corporate Research And Development Center Toshiba Corporation

著作論文

• Mechanism for Reducing Dislocations at the Initial Stage of GaN Growth on Sapphire Substrates Using High-Temperature-Grown Single-Crystal AlN Buffer Layers : Semiconductors

スポンサーリンク