Sano Naoki | Hightec Systems Corporation

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概要

• SANO Naokiの詳細を見る
• 同名の論文著者
• Hightec Systems Corporationの論文著者

関連著者

• Sano Naoki

  Hightec Systems Corporation

• Sameshima Toshiyuki

  Tokyo A&t University

• Andoh Yasunori

  NISSIN Electric Co., Ltd., Kyoto 615-8686, Japan

• Andoh Nobuyuki

  Tokyo Univ. Agriculture And Technol. Tokyo Jpn

• Matsuda Yasuhiro

  Nissin Ion Equipment Co., Ltd., Koka, Shiga 528-0068, Japan

• Maki Masato

  Tokyo University Of Agriculture And Technology

• Sameshima Toshiyuki

  Tokyo University Of Agriculture And Technology

• ANDOH Nobuyuki

  Tokyo University of Agriculture and Technology

• Sameshima Toshiyuki

  Hightec Systems Corporation

• Andoh Yasunori

  Nissin Ion Equipment. Co., Ltd., Kyoto 601-8205, Japan

• MATSUDA Yasuhiro

  Tokyo University of Agriculture and Technology

• Andoh Yasunori

  Nissin Ion Equipment Co. Ltd

• Andoh Yasunori

  Nissin Ion Equipment Co., Ltd., Koka, Shiga 528-0068, Japan

• Andoh Nobuyuki

  Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan

• Takiuchi Megumu

  Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan

• Sameshima Toshiyuki

  Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan

• Sano Naoki

  Hightec Systems Corporation, Yokohama 222-0033, Japan

• Ukawa Kan

  Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan

• Kanda Yasushi

  Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan

• Naito Masao

  Nissin Ion Equipment Co., Ltd., Koka, Shiga 528-0068, Japan

• Hamamoto Nariaki

  Nissin Ion Equipment Co., Ltd., Koka, Shiga 528-0068, Japan

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著作論文

• Infrared Semiconductor Laser Crystallization of Silicon Thin Films Using Diamond-Like Carbon as Photoabsorption Layer
• Activation of Implanted Phosphorus Atoms in Silicon Wafers by Infrared Semiconductor Laser Annealing Using Carbon Films as Optical Absorption Layers
• Activation of Implanted Boron Atoms in Silicon Wafers by Infrared Semiconductor Laser Annealing Using Carbon Films as Optical Absorption Layers
• Activation of Silicon Implanted with Phosphorus Atoms by Infrared Semiconductor Laser Annealing
• Recrystallization Behavior of Silicon Implanted with Phosphorus Atoms by Infrared Semiconductor Laser Annealing
• Activation of Silicon Implanted with Phosphorus and Boron Atoms by Infrared Semiconductor Laser Rapid Annealing

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