スポンサーリンク
Institute of Physics | 論文
- Defect-induced color-tunable monolithic GaN-based light-emitting diodes
- Kinetic Monte Carlo simulations of boron activation in implanted Si under laser thermal annealing
- Vibration analysis of a graphene-substrate structure
- Design of polarization-dipole-induced isotype heterojunction diodes for use in III–N hot electron transistors
- All solution-processed amorphous oxide thin-film transistors using UV/O
- Cross-sectional observation of stacking faults in 4H-SiC by KOH etching on nonpolar [Formula: see text] face, cathodoluminescence imaging, and transmission electron microscopy
- Alcohol additive effect in hydrogen generation from water with carbon by photochemical reaction
- Enhanced thermoelectric performance of Al-doped ZnO thin films on amorphous substrate
- Optical tuning of extraordinary optical transmission through a metallic hole array using azobenzene dye-doped nematic liquid crystal
- Characterization of as-deposited and sintered yttrium iron garnet thick films formed by aerosol deposition
- High-peak-power vertical-cavity surface-emitting laser quasi-array realized using optimized large-aperture single emitters
- Manipulating fluorescence characteristics of conjugated fluorescent molecules incorporated into three-dimensional poly(methyl methacrylate) opal photonic crystals
- Comparison of slicing-induced damage in hexagonal SiC by wire sawing with loose abrasive, wire sawing with fixed abrasive, and electric discharge machining
- Atomic-scale behavior of adatoms in axial and radial growth of GaN nanowires: Molecular dynamics simulations
- Characterization of TiHfN ternary alloy films as a barrier between Cu plug and Si
- Rapid measurement of ultrahigh viscosity using an electro-magnetically spinning system
- Carbon nanotube–Cu/parylene nanowire array electrical fasteners with high adhesion strength
- Thermal stability of paramagnetic defect centers in amorphous silicon nitride films
- A low-power all-optical bistable device based on a liquid crystal layer embedded in thin gold films
- Throughput comparison of multiexposure and multibeam laser interference lithography on nanopatterned sapphire substrate process