Thermal stability of paramagnetic defect centers in amorphous silicon nitride films

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概要

• 論文の詳細を見る
• Institute of Physicsの論文
• 2014-04-03

著者

• Kobayashi Kiyoteru

  Graduate School of Engineering, Tokai University, 4-1-1 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan

• Kobayashi Kiyoteru

  Graduate School of Engineering, Tokai University, Hiratsuka, Kanagawa 259-1292, Japan.

関連論文

• Ultraviolet Light-Induced Conduction Current in Silicon Nitride Films
• Photoinduced Leakage Currents in Silicon Carbon Nitride Dielectrics for Copper Diffusion Barriers
• Thermal stability of paramagnetic defect centers in amorphous silicon nitride films

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