Elongated Inductively Coupled Thermal Plasma Torch Operable at Atmospheric Pressure (Special Issue : Dry Process)

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文

著者

• Okumura Tomohiro

  Production Core Engineering Laboratory Matsushita Electric (panasonic)

• Okumura Tomohiro

  Production Engineering Laboratory, Panasonic Corporation, Kadoma, Osaka 571-8502, Japan

• Kawaura Hiroshi

  CV Research Corporation, Ichikawa, Chiba 272-0001, Japan

関連論文

• Atmospheric Pressure Plasma Treatment and Non-Flux Lead-Free-Soldering of Cu Wire and Strand
• Fine Pattern Etching of Molybdenum Thin Film and Silicon Substrate by Using Atmospheric Line-Shaped Microplasma Source
• Elongated Inductively Coupled Thermal Plasma Torch Operable at Atmospheric Pressure
• Fine Pattern Etching of Silicon Substrates Using Atmospheric Line-Shaped Microplasma Source
• Elongated Inductively Coupled Thermal Plasma Torch Operable at Atmospheric Pressure (Special Issue : Dry Process)

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