Elongated Inductively Coupled Thermal Plasma Torch Operable at Atmospheric Pressure

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概要

• 論文の詳細を見る

• An elongated inductively coupled plasma (ICP) torch that enables instantaneous thermal processing over a large area has been newly developed. Its circular chamber configuration enabled the generation of elongated thermal plasma. A racetrack chamber with a groove showed improvement of plasma stability. The surface temperature distribution over a substrate was measured using a simplified perpendicular-racetrack-type torch with a length of 130 mm; the surface of a glass substrate was heated to 798 K at a scanning speed of 50 mm/s and the peak temperature variation over a substrate along the longitudinal line was within \pm 5.5 K in the best case. A sputtered amorphous silicon thin film was successfully crystallized.

• 2013-05-25

著者

• Okumura Tomohiro

  Production Core Engineering Laboratory Matsushita Electric (panasonic)

• Okumura Tomohiro

  Production Engineering Laboratory, Panasonic Corporation, Kadoma, Osaka 571-8502, Japan

• Kawaura Hiroshi

  CV Research Corporation, Ichikawa, Chiba 272-0001, Japan

関連論文

• Atmospheric Pressure Plasma Treatment and Non-Flux Lead-Free-Soldering of Cu Wire and Strand
• Fine Pattern Etching of Molybdenum Thin Film and Silicon Substrate by Using Atmospheric Line-Shaped Microplasma Source
• Elongated Inductively Coupled Thermal Plasma Torch Operable at Atmospheric Pressure
• Fine Pattern Etching of Silicon Substrates Using Atmospheric Line-Shaped Microplasma Source
• Elongated Inductively Coupled Thermal Plasma Torch Operable at Atmospheric Pressure (Special Issue : Dry Process)

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