Okumura Tomohiro | Production Core Engineering Laboratory Matsushita Electric (panasonic)
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概要
- Okumura Tomohiroの詳細を見る
- 同名の論文著者
- Production Core Engineering Laboratory Matsushita Electric (panasonic)の論文著者
関連著者
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Okumura Tomohiro
Production Core Engineering Laboratory Matsushita Electric (panasonic)
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Saitoh Mitsuo
Production Core Engineering Laboratory Matsushita Electric (panasonic)
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Okumura Tomohiro
Production Engineering Laboratory, Panasonic Corporation, Kadoma, Osaka 571-8502, Japan
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Kawaura Hiroshi
CV Research Corporation, Ichikawa, Chiba 272-0001, Japan
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Furusawa Akio
Jisso Core Engineering Laboratory Matsushita Electric (panasonic)
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Suetsugu Kenichiro
Jisso Core Engineering Laboratory Matsushita Electric (panasonic)
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OKUMURA Tomohiro
Production Core Engineering Laboratory, Matsushita Electric (Panasonic)
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NISHIKAWA Kazutaka
Production Core Engineering Laboratory, Matsushita Electric (Panasonic)
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Nishikawa Kazutaka
Production Core Engineering Laboratory Matsushita Electric (panasonic)
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Yashiro Yoichiro
Production Engineering Center, Matsushita Electric Industrial, Co., Ltd., 2-7 Matsuba-cho, Kadoma, Osaka 571-8502, Japan
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Kimura Tadashi
Production Core Engineering Laboratory, Matsushita Electric Industrial, Co., Ltd., 2-7 Matsuba-cho, Kadoma, Osaka 571-8502, Japan
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Saitoh Mitsuo
Production Core Engineering Laboratory, Matsushita Electric Industrial, Co., Ltd., 2-7 Matsuba-cho, Kadoma, Osaka 571-8502, Japan
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Matsuda Izuru
Production Core Engineering Laboratory, Matsushita Electric Industrial, Co., Ltd., 2-7 Matsuba-cho, Kadoma, Osaka 571-8502, Japan
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Okumura Tomohiro
Production Core Engineering Laboratory, Matsushita Electric Industrial, Co., Ltd., 2-7 Matsuba-cho, Kadoma, Osaka 571-8502, Japan
著作論文
- Atmospheric Pressure Plasma Treatment and Non-Flux Lead-Free-Soldering of Cu Wire and Strand
- Fine Pattern Etching of Molybdenum Thin Film and Silicon Substrate by Using Atmospheric Line-Shaped Microplasma Source
- Elongated Inductively Coupled Thermal Plasma Torch Operable at Atmospheric Pressure
- Fine Pattern Etching of Silicon Substrates Using Atmospheric Line-Shaped Microplasma Source
- Elongated Inductively Coupled Thermal Plasma Torch Operable at Atmospheric Pressure (Special Issue : Dry Process)