Resist removal method using Xe2 excimer ultraviolet light

スポンサーリンク

概要

• 論文の詳細を見る

著者

• Goto Yousuke

  Research Laboratory For Integrated Technological Systems Kanazawa Institute Of Technology

• Kono Akihiko

  Kanazawa Inst. Technol. Ishikawa Jpn

関連論文

• Effect of cooling rate after polymer melting on electrical properties of high-density polyethylene/Ni composites
• Order of Reaction between Photoresist and Atomic Hydrogen Generated by a Tungsten Hot-Wire Catalyst
• Relationship between the thermal hardening of ion-implanted resist and the resist removal using atomic hydrogen
• Removal of ion implanted resists with various acceleration energy using wet ozone
• Resist removal method using Xe2 excimer ultraviolet light
• Substrate Temperature Dependence of the Photoresist Removal Rate Using Atomic Hydrogen Generated by a Hot-Wire Tungsten Catalyst
• Study of the Removal of Ion-Implanted Resists Using Wet Ozone
• Removal of Ion-implanted Resists using High Concentration Wet Ozone
• Removal Characteristics of Resists Having Different Chemical Structures by Using Ozone and Water

スポンサーリンク