Removal Characteristics of Resists Having Different Chemical Structures by Using Ozone and Water

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We investigated an environmentally friendly resist removal method using ozone and water (wet ozone). The resist removal rate was optimum when the temperature of the wet ozone was 83 °C and that of the substrate was 78 °C. Novolak resin of a positive type of novolak resist base polymer has a carbon–carbon double bond in the main chain, so Novolak resin reacted easily with ozone. The resulting removal rate of the novolak resist was about 1.1 μm/min, which was the highest removal rate among novolak, KrF and ArF resists. For all implanted ion species (B, P, and As), all the resist with ions of $5\times 10^{13}$ atoms/cm2 could be removed. Resist with $5\times 10^{14}$ atoms/cm2 As and P ions could not be removed at al, but resist with B ion could be removed. The energy to harden the resist of B ion was less than that to harden P and As ions, because B ion is lighter than the other ions. All the resist with ions of $5\times 10^{15}$ atoms/cm2 could not be removed.
2009-02-25