25nm wide silicon trench fabrication by edge lithography (Special issue: Dry process)

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文

著者

• Hirai Yoshihiko

  Osaka Prefecture Univ. Osaka Jpn

• Kawata Hiroaki

  Osaka Prefecture Univ. Osaka Jpn

• Sakamoto Junji

  Osaka Prefecture University, Sakai 599-8531, Japan

• Yasuda Masaaki

  Osaka Prefecture University, Sakai 599-8531, Japan

関連論文

• Fabrication of Diffractive Optical Elements on a Si Chip by Imprint Lithography using Novel Mold (特集 複雑な構造を多様な材料で実現する技術)
• Fabrication of novel high aspect ratio pillars using fine flexible mold by UV-NIL
• Novel Mold Fabrication for Nano-Imprint Lithography to Fabricate Single-Electron Tunneling Devices
• Resonance Characteristics of Micro Cantilever in Liquid
• Fine Pattern Fabrication on a Polymer Plate by Direct Imprint Lithography (特集 複雑な構造を多様な材料で実現する技術)
• Polymer Science in Nanoimprint Lithography
• 25nm wide silicon trench fabrication by edge lithography (Special issue: Dry process)
• Study on Polymer Materials Evaluation System for Nano-Imprint Lithography
• Simulation of Resist Filling Properties under Condensable Gas Ambient in Ultraviolet Nanoimprint Lithography (Special Issue : Microprocesses and Nanotechnology)

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