Novel Mold Fabrication for Nano-Imprint Lithography to Fabricate Single-Electron Tunneling Devices
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-12-30
著者
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HIRAI Yoshihiko
Osaka Prefecture University
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TANAKA Yoshio
Osaka Prefecture University
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Kanemaki Y
Osaka Prefecture Univ. Osaka Jpn
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KANEMAKI Yasuhito
Osaka Prefecture University, College of Engineering
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MURATA Kazuo
Technology Research Institute of Osaka Prefecture
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Hirai Yoshihiko
Osaka Prefecture Univ. Osaka Jpn
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Hirai Yoshihiko
Osaka Prefecture University College Of Engineering
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Tanaka Yoshio
Osaka Prefecture University College Of Engineering
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- Application of X-Ray Stress Measuring Technique to Curved Surfaces : Residual Stress on Spherical Surfaces
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