Study of high etch rate bottom antireflective coating and gap fill materials using dextrin derivatives in ArF lithography

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文

著者

• Takei Satoshi

  Nissan Chemical Ind. Ltd. Toyama Jpn

• Shinjo Tetsuya

  Nissan Chemical Industries Ltd. Toyama Jpn

関連論文

• Study of Self Cross-Link Bottom Antireflective Coating and Gap Fill Materials for Sublimate Defect Reduction in ArF Lithography
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• Step and Flash Nano Imprint Lithography of 80 nm Dense Line Pattern Using Trehalose Derivative Resist Material
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