Formation and Magnetic Properties of Ultrahigh Density Fe3Si Nanodots Epitaxially Grown on Si(111) Substrates Covered with Ultrathin SiO2 Films

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概要

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• The epitaxial growth technique of ultrahigh density (${>}10^{12}$ cm-2) Fe3Si nanodots (NDs) on Si(111) substrates was developed using an ultrathin SiO2 film technique. Low temperature (${<}300$ °C) growth of the Fe3Si NDs was needed to suppress the interdiffusion between Fe atoms deposited on the sample surface and Si atoms in the substrate. The ND shape changed drastically from sphere to discontinuous films as the Fe content was increased slightly from a stoichiometric ratio of $\text{Fe}:\text{Si}$ of $3:1$. For almost-spherical NDs with the ultrahigh density, a transition from superparamagnetism to ferromagnetism was observed at specific temperatures, the ferromagnetism of which included the magnetic dipole interactions in ultrahigh density ND system. These ND structures with ND size dependence of the coercive force were expected to be selectively used as both magnetically fixed and free layers in magnetic tunneling junction structures only by changing the ND size.

• 2011-01-25

著者

• Ichikawa Masakazu

  Department Of Physics Faculty Of Science And Engineering Waseda University

• Nakamura Yoshiaki

  Graduate School Of Engineering Hokkaido University

• Amari Shogo

  Department of Applied Physics, Graduate School of Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan

• TANAKA Nobuo

  EcoTopia Science Institute and Department of Crystalline Materials Science, Nagoya University

• Cho Sung-Pyo

  Ecotopia Science Institute, Nagoya University, Nagoya 464-8603, Japan

• Tanaka Nobuo

  Ecotopia Science Institute, Nagoya University, Nagoya 464-8603, Japan

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