Nickel Plating on Silicon for Fabricating an Infrared Wire-Grid Polarizer
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概要
- 論文の詳細を見る
An IR polarizer was fabricated by plating a Ni wire-grid on a Si substrate. The Si surface was processed by photolithography to create grooves with ${\sim}200$ nm width, ${\sim}200$ nm spacing, and ${\sim}300$ nm depth. After surface treatment, the Si plate was put in a plating bath for ${\sim}5$ min to fill the grooves with Ni. The excess Ni film that was deposited outside the grooves was removed by mechanical polishing. The fabricated wire-grid exhibited a polarization function with an extinction ratio of 15–20 dB in the 3–13 μm wavelength range.
- 2010-05-25
著者
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Saito Mitsunori
Department Of Electrical Communications Tohoku University
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Yamamoto Tatsuya
Department Of Applied Chemistry Graduate School Of Engineering Hiroshima University
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Masashi Urano
Meltex Inc., Osaka 540-0028, Japan
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Junji Nishii
National Institute of Advanced Industrial Science and Technology, Ikeda, Osaka 563-8577, Japan
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Itsunari Yamada
National Institute of Advanced Industrial Science and Technology, Ikeda, Osaka 563-8577, Japan
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Yamada Itsunari
National Institute of Advanced Industrial Science and Technology, Ikeda, Osaka 563-8577, Japan
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Susumu Mihara
Meltex Inc., Osaka 540-0028, Japan
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Tatsuya Yamamoto
Department of Electronics and Informatics, Ryukoku University, Otsu 520-2194, Japan
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