Fabrication of Mid-Infrared Tunable Filter with Roughened Silicon Plates
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概要
- 論文の詳細を見る
We fabricated infrared Fabry–Perot filters by stacking two wet-etched silicon plates. The silicon plates were etched in a KOH solution to 100 μm thickness to reduce the driving voltage, and were scratched before etching to suppress the interference inside the silicon plates. When a voltage was applied to the filter, the spacing between the plates changed due to an electrostatic force, which caused a shift in the interference peaks. When the voltage was increased from 0 to 50 V, an interference peak shifted from an 8.0 wavelength to a 4.1 μm wavelength, corresponding to the decrease in the spacing from 4.1 to 2.1 μm.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-09-15
著者
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Yamada Itsunari
Department Of Electrical Engineering Osaka University
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Saito Mitsunori
Department Of Electrical Communications Tohoku University
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Yamada Itsunari
Department of Electronics and Informatics, Ryukoku University, Otsu 520-2194, Japan
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