Analysis of Indium Diffusion Profiles Based on the Fermi-Level Effect in Single-Crystal Zinc Oxide
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概要
- 論文の詳細を見る
The diffusion of indium in single-crystal ZnO was studied by an ion implantation technique (accelerating voltage of 170 keV and dose of $1\times 10^{16}$ cm-2) in the temperature range between 750 and 850 °C. The indium profiles have a characteristic tail with a constant concentration region due to the Fermi-level effect on the diffusion. The simulated profiles of indium diffusion in ZnO fitted well with the experimentally determined profiles. We propose a possible models for indium diffusion based on an interstitialcy mechanism or a vacancy mechanism.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2008-10-25
著者
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Haneda Hajime
Sensor Materials Center National Institute For Materials Science
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SAKAGUCHI Isao
Optronic Materials Center, National Institute for Materials Science
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OHASHI Naoki
Optronic Materials Center, National Institute for Materials Science
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MATSUMOTO Kenji
Sensor Materials Center, National Institute for Materials Science
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Nakagawa Tsubasa
Optronic Materials Center National Inst. For Materials Sci.
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Haneda Hajime
Sensor Materials Center, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
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Nakagawa Tsubasa
Optronic Materials Center, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
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Uematsu Masashi
Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku, Yokohama 223-8522, Japan
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Sakaguchi Isao
Optronic Materials Center, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
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