Frequency Change of Quartz Crystal Resonator Caused during Ion Beam Etching

概要

論文の詳細を見る
For the frequency adjustment of a quartz crystal resonator, vacuum evaporation and ion beam etching are employed. However, with ion beam etching, a phenomenon occurs due to which the frequency further changes after the frequency adjustment and therefore high accuracy can not be obtained, which prevents the practical application. To address this issue, a theoretical analysis was conducted on the frequency change of the quartz crystal resonator caused by ion beam etching. The analysis determined the temperature distribution change of the quartz crystal resonator during ion beam irradiation by the finite difference method, and it was observed that this change of the radial direction of the disk crystal and the time constant of frequency change were equal. The temperature distribution change of the quartz crystal resonator during ion beam irradiation was calculated by the finite difference method. It was observed that the radial temperature distribution change and time constant of frequency change were equal. Subsequently, the heat stress distribution was calculated from the temperature distribution using a column coordinate model, and the change in resonance frequency was calculated by the perturbation method from the change in the elastic constant caused by this stress. In the analysis of AT-, BT-, and SC-cut resonators, both the calculated and experimental results were found to be in agreement. These results showed that thermal stress arose in the temperature distribution change caused during ion beam irradiation, and this thermal stress caused the frequency to change by changing the elastic constant.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2007-07-30

Frequency Change of Quartz Crystal Resonator Caused during Ion Beam Etching

スポンサーリンク

概要

著者

関連論文

スポンサーリンク