Mechanism of Quantum Dot Formation by Postgrowth Annealing of Wetting Layer
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概要
- 論文の詳細を見る
Low density InAs/GaAs quantum dots (QDs) can be formed by postgrowth annealing of an InAs wetting layer thinner than the critical thickness corresponding to conventional transition from two- to three- dimensional (2D–3D) growth modes. Using real-time reflection high-energy-electron diffraction, the time evolution of total QD volume is analyzed. Based on a mean-field theory [Phys. Rev. Lett. 79 (1997) 897], the initially increasing and finally saturating QD volume is simply and well explained by QD nucleation from precursors. It is suggested that precursors start to grow at an exponential rate well before the 2D–3D growth mode transition, and are responsible for the usually observed significant mass transport from a wetting layer to QDs in conventional QD growth.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-04-30
著者
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SASAKURA Hirotaka
CREST JST
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Yokoyama Naoki
Nanotechnology Research Center Fujitsu Laboratories Ltd.
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Yokoyama Naoki
Nanotechnology Research Center, Fujitsu Lab. Ltd., 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan
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Song Haizhi
Nanotechnology Research Center, Fujitsu Lab. Ltd., 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan
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Usuki Tatsuya
Nanotechnology Research Center, Fujitsu Lab. Ltd., 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan
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Nakata Yoshiaki
Nanotechnology Research Center, Fujitsu Lab. Ltd., 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan
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Muto Shunichi
CREST, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan
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Sasakura Hirotaka
CREST, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan
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