Unbalanced Magnetron Sputtering Using Cylindrical Target for Low-Temperature Optical Coating
スポンサーリンク
概要
- 論文の詳細を見る
A new optical coating technology was developed for the first time using unbalanced magnetron sputtering combined with a cylindrical target. A significant reduction of ignition and glow discharge voltages were observed by adding magnets to carry out the unbalanced magnetron sputtering. A high deposition rate of 30 nm/min was realized for TiO2 film preparation; this rate was approximately 3 times larger than that obtained by conventional magnetron sputtering. Moreover, deposition power efficiency twice as large as that obtained by conventional magnetron sputtering was realized. A fine-grain structure was observed and a large refraction index of 2.65 was obtained.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-01-15
著者
-
Sasaki Kimihiro
Graduate School Of Natural Sci. & Technol. Kanazawa Univ.
-
Hata Tomonobu
Graduate School Of Natural Science And Technology Kanazawa University
-
Yonezawa Yasuto
Electricity/information Science Industrial Research Institute Of Ishikawa
-
Wang Cheng-Shih
Graduate School of Natural Science & Technology Kanazawa University, 2-40-20 Kodatsuno, Kanazawa 920-8667, Japan
-
Yonezawa Yasuto
Electricity/Information Science Industrial Research Institute of Ishikawa, 2-1 Kuratsugi, Kanazawa 920-8203, Japan
-
Hata Tomonobu
Graduate School of Natural Science & Technology Kanazawa University, 2-40-20 Kodatsuno, Kanazawa 920-8667, Japan
-
Sasaki Kimihiro
Graduate School of Natural Science & Technology Kanazawa University, 2-40-20 Kodatsuno, Kanazawa 920-8667, Japan
関連論文
- Room Temperature Thermoelectric Properties of Epitaxially Grown Si-Ge Thin Films on SOI Substrates
- Structural Properties of Heavily B-Doped SiGe Thin Films for High Thermoelectric Power
- Anomalous Large Thermoelectric PoWer on Heavily B-Doped SiGe Thin Films with Thermal Annealing : Structure and Mechanical and Thermal Properties of Condensed Matter
- Investigation of Thermoelectric Properties of Si/Ge Multilayer with Ultra-Heavily B Doping
- Improved Dielectric Properties of Tetragonal ZrO2 Gate Dielectric Fabricated by Ozone-Assisted Sputtering
- Crystallinity and Thermoelectric Properties of Si/GeB Multilayers Prepared with Si Buffer Layer and SiO2 Substrates
- Unbalanced Magnetron Sputtering Using Cylindrical Target for Low-Temperature Optical Coating