Thermoelectric Properties of RF-Sputtered SiGe Thin Film for Hydrogen Gas Sensor

概要

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Phosphorus-doped Si0.8Ge0.2 thin films were deposited on the Si3N4/SiO2/Si substrate by the RF sputtering. Thermal annealing was carried out to crystallize as-deposited, amorphous-like SiGe thin films. With increasing annealing temperature and time, the crystallization of the SiGe thin films progressed, resulting in a high carrier mobility and a large absolute value of Seebeck coefficient. The SiGe thin film deposited on the Si3N4/SiO2/Si substrate and then annealed at 850°C for 5 h at an argon flow rate of 150 cc/min showed a Seebeck coefficient of $-198$ μV/K, a Hall mobility of 10.54 cm2/Vs, a carrier concentration of $1.1\times 10^{18}$ cm-3 at 100°C. The thermoelectric hydrogen sensor with the SiGe thin film annealed at 850°C for 5 h showed a voltage signal of 5.81 mV, a catalyst activity of 16.17°C and a response time, corresponding to 90% voltage signal of 50 s for 3% H2 in air. The sensor operating at 100°C detected hydrogen in air at concentrations from 0.01 to 3%, and showed a good linearity between voltage signal and gas concentration.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2004-09-15