Growth and Surface Morphology of Textured NiO Thin Films Deposited by Off-Axis RF Magnetron Sputtering

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概要

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• Textured crystalline NiO thin films were grown on Si(100) substrates by off-axis RF magnetron sputtering without substrate heating using a NiO target. (100)-textured NiO films were obtained using pure Ar gas. On the other hand, (111)-textured NiO films were obtained using pure O2 gas. Also, the surface morphology and roughness of the NiO thin films were closely related to the type of sputtering gas and RF power.

• INSTITUTE OF PURE AND APPLIED PHYSICSの論文
• 2004-08-15

著者

• Ryu Hyun-wook

  Research Institute Of Energy Resources Technology Chosun University

• Park Jin-seong

  Department Of Advanced Materials Engineering Chosun University

• Hong Gwang-jun

  Department Of Physics Chosun University

• Choi Gwang-pyo

  Research Institute Of Energy Resources Technology Chosun University

• Ryu Hyun-Wook

  Research Institute of Energy Resources Technology, Chosun University, Gwangju 501-759, Korea

• Park Jin-Seong

  Department of Advanced Materials Engineering, Chosun University, Gwangju 501-759, Korea

• Hong Gwang-Jun

  Department of Physics, Chosun University, Gwangju 501-759, Korea

• Choi Gwang-Pyo

  Research Institute of Energy Resources Technology, Chosun University, Gwangju 501-759, Korea

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