Photocatalytic Functional Coating of TiO<sub>2</sub> Thin Film Deposited by Cyclic Plasma Chemical Vapor Deposition at Atmospheric Pressure
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概要
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Photocatalytic TiO<sub>2</sub> thin films were prepared with titanium tetraisopropoxide (TTIP) using cyclic plasma chemical vapor deposition (CPCVD) at atmospheric pressure. The CPCVD TiO<sub>2</sub> films contain carbon-free impurities up to 100 °C and polycrystalline anatase phases up to 200 °C, due to the radicals and ion-bombardments. The CPCVD TiO<sub>2</sub> films have high transparency in the visible wavelength region and absorb wavelengths below 400 nm (${>}3.2$ eV). The photocatalytic effects of the CPCVD TiO<sub>2</sub> and commercial sprayed TiO<sub>2</sub> films were measured by decomposing methylene blue (MB) solution under UV irradiation. The smooth CPCVD TiO<sub>2</sub> films showed a relatively lower photocatalytic efficiency, but superior catalyst-recycling efficiency, due to their high adhesion strength on the substrates. This CPCVD technique may provide the means to produce photocatalytic thin films with low cost and high efficiency, which would be a reasonable candidate for practical photocatalytic applications, because of the reliability and stability of their photocatalytic efficiency in a practical environment.
- 2011-08-25
著者
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Park Jin-seong
Department Of Advanced Materials Engineering Chosun University
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Kwon Jung-Dae
Material Processing Research Division, Korea Institute of Materials Science, Changwon, Gyeongnam 641-831, Korea
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Rha Jong-Joo
Material Processing Research Division, Korea Institute of Materials Science, Changwon, Gyeongnam 641-831, Korea
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Nam Kee-Seok
Material Processing Research Division, Korea Institute of Materials Science, Changwon, Gyeongnam 641-831, Korea
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