Formation of $\beta$-FeSi2 Microstructures by Reactive Ion Etching Using SF6 Gas
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概要
- 論文の詳細を見る
The reactive ion etching (RIE) technique, using SF6 as reaction gas, was applied for the formation of microstructures of semiconductor $\beta$-FeSi2 films. The etching mask is an Al film patterned by photolithography and wet chemical etching. The maximum etch rate of $\beta$-FeSi2 is 0.1 μm/min and the etch selectivity of $\beta$-FeSi2 to the Al mask is about 1. This attempt suggests that existing RIE techniques for Si process may be applied directly to the micro fabrication of $\beta$-FeSi2.
- 2004-08-15
著者
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MAKITA Yunosuke
National Institute of Advanced Industrial Science and Technology (AIST)
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TANOUE Hisao
National Institute of Advanced Industrial Science and Technology (AIST)
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LIU Zhengxin
System Engineers' Co., Ltd.
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Osamura Masato
System Engineers' Co. Ltd.
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WANG Shinan
Japan Science and Technology Corporation (JST)
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FUKUZAWA Yasuhiro
Japan Science and Technology Corporation (JST)
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OTOGAWA Naotaka
Japan Science and Technology Corporation (JST)
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NAKAYAMA Yasuhiko
Japan Science and Technology Corporation (JST)
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Ootsuka Teruhisa
System Engineers' Co. Ltd.
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Suzuki Yasuhito
System Engineers' Co. Ltd.
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Wang Shinan
Japan Science and Technology Corporation (JST), AIST Tsukuba West, Tsukuba, Ibaraki 305-8569, Japan
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Tanoue Hisao
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Tsukuba, Ibaraki 305-8568, Japan
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Ootsuka Teruhisa
System Engineers' Co., Ltd., Yamato, Kanagawa 242-0001, Japan
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Osamura Masato
System Engineers' Co., Ltd., Yamato, Kanagawa 242-0001, Japan
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Suzuki Yasuhito
System Engineers' Co., Ltd., Yamato, Kanagawa 242-0001, Japan
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Makita Yunosuke
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Tsukuba, Ibaraki 305-8568, Japan
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Fukuzawa Yasuhiro
Japan Science and Technology Corporation (JST), AIST Tsukuba West, Tsukuba, Ibaraki 305-8569, Japan
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Liu Zhengxin
System Engineers' Co., Ltd., Yamato, Kanagawa 242-0001, Japan
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Nakayama Yasuhiko
Japan Science and Technology Corporation (JST), AIST Tsukuba West, Tsukuba, Ibaraki 305-8569, Japan
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