Electron Beam Recording with a Novel Differential Pumping Head Realizing More than 50 GB/Layer Capacity Disc
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概要
- 論文の詳細を見る
We developed an electron beam recorder with a novel differential pumping head, which produces a local high-vacuum area for an electron beam by balancing nitrogen gas flow into and out of the head. Regarding recording speed, it was confirmed to be as high as 4.92 m/s while maintaining a $10^{-3}$ Pa vacuum condition. In order to achieve a high speed recording velocity, we introduced an electron gun with a low acceleration voltage (15 kV) and a chemically amplified resist to the mastering to make resist sensitivity very high. In addition, it takes only 2 min to exchange the Si substrate. As for the performance of the electron beam mastering, a bottom jitter value appropriate for mass production was obtained from a 25 GB/layer capacity disc. We also fabricated a 50 GB/layer capacity disc and confirmed the HF signal using a near-field optical pick up for the first time. Furthermore, we were able to fabricate a 100 GB/layer capacity disc using our electron beam recorder.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2003-02-15
著者
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TAKEDA Minoru
Optical System Development Group, HENC, Sony Corporation
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KAWASE Hiroshi
Manufacturing Eng. Dev., Ctr., MSNC, Sony Corporation
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Aki Yuichi
Manufacturing Eng. Dev. Ctr. Msnc Sony Corporation
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Takashima Susumu
Semiconductor Equipment Division Jeol Ltd.
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Koizumi Mitsuru
Semiconductor Equipment Division Jeol Ltd.
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Miyokawa Toshiaki
Semiconductor Equipment Division Jeol Ltd.
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Date Naoki
Semiconductor Equipment Division Jeol Ltd.
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Yamamoto Masanobu
Optical Disc Development Division, AV/IT Development Group, Sony Corporation, 6-7-35 Kitashinagawa, Shinagawa-ku, Tokyo 141-0001, Japan
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Aki Yuichi
Manufacturing Engineering Development Center, Core Technology & Network Company, Sony Corporation, 6-7-35 Kitashinagawa, Shinagawa-ku, Tokyo 141-0001, Japan
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Furuki Motohiro
Optical Disc Development Division, AV/IT Development Group, Sony Corporation, 6-7-35 Kitashinagawa, Shinagawa-ku, Tokyo 141-0001, Japan
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Miyokawa Toshiaki
Semiconductor Equipment Division, JEOL Ltd, 3-1-2 Musashino, Akishima, Tokyo 196-8555, Japan
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Kawase Hiroshi
Manufacturing Engineering Development Center, Core Technology & Network Company, Sony Corporation, 6-7-35 Kitashinagawa, Shinagawa-ku, Tokyo 141-0001, Japan
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Koizumi Mitsuru
Semiconductor Equipment Division, JEOL Ltd, 3-1-2 Musashino, Akishima, Tokyo 196-8555, Japan
関連論文
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- Progress in Electron Beam Mastering of 100 Gbit/inch2 Density Disc
- Approach of Improving Disk Performance to High-Quality Gap Control in Near-Field Optical Disk Drive System
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- Analysis of Near-Field Readout Characteristics Using Approximate Vector Diffraction Calculation
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- Electron Beam Recording with a Novel Differential Pumping Head Realizing More than 50 GB/Layer Capacity Disc