Time-Resolved Electron Energy Distribution Function in Pulsed Surface Wave Plasma Generated by Ring-Slot Antenna

概要

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Time-resolved probe measurements of the electron energy distribution function (EEDF) in a substrate (wafer) holder were performed in a pulse-modulated argon plasma of high density (${>}10^{11}$/cm3), low electron temperature (${<}2$ eV) and excellent uniformity ($\pm 3$% over 24 cm diameter). The plasma was produced by a time-modulated surface wave power with a ring-slot antenna. Microwave power (2.45 GHz, 1 kW max.) was modulated with a square wave pulse of 100 μs duration and 20–90% duty ratio. The temporal evolution of the EEDF was divided into two zones, namely, the zone where the microwave power is turned on (active plasma region: on-time) and that where the power is turned off (afterglow plasma region: off-time). In the first zone, the EEDF shows a fast evolution in which the number of high-energy electrons (high-energy tail of EEDF) increases with time. The second zone is characterized by a significant decrease in the number of high-energy electrons and an increasing EEDF that shifts to low energy values. These characteristics were compared with those of the continuously driven (CW) plasma.
Japan Society of Applied Physicsの論文
2003-10-01