Ｘ線応用３次元加工用シミュレーションシステムの開発

概要

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We have developed an X-ray lithography simulation system X3D (Moving Mask Deep X-ray Lithography Simulation System for 3-Dimensional Fabrication) for the first time, that is tailored to simulate the fabrication process of 3-dimensional microstructures using the M2DXL (Moving Mask Deep X-ray Lithography) technique. The newly developed X3D can simulate the progress of developed PMMA surface with developing time using chemical dissolution rate data as a function of dose energy. The simulation system consists of three modules: mask generation, exposure, and development. The exposure module calculates a dose energy distribution over a PMMA using a mask pattern and its movement pattern, and then converts this dose energy to a dissolution rate of PMMA. The development module adopted a "Fast Marching Method" to calculate the resultant 3D shape of the PMMA. In this paper, a new experimental method to determine dissolution rate as a function of dose energy that dominates the simulation accuracy was proposed. An experimental procedure of the new experimental method, the determined dissolution rate, and verification of the measured results are presented.