1-1 集束イオンビーム化学気相成長法における成長高さ補正に関する研究(OS2-1 三次元の微細形状創成技術)

概要

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Focused-ion-beam chemical vapor deposition (FIB-CVD) is a key technology to fabricate the three-dimensional (3-D) nano- and microstructures. However, FIB-CVD has a problem on the faithfulness of the 3-D structure growth. Therefore, vertical growth characteristics of a quadrangular prism as an evaluation model were evaluated in this study. As a result, the growth height of a quadrangular prism structure depended on the number of the irradiation point, and the correction method of a growth error was also examined to achieve the arbitrary 3-D structures. And, we found that the vertical growth rates follow the sigmoid function and the vertical growth error can be corrected by controlling the irradiation time of Ga^+ FIB.
一般社団法人日本機械学会の論文
2011-09-25