Electrical and Tribological Characteristics of Metal-Doped Carbon Thin Films(Materials,<Special Section>Recent Development of Electromechanical Devices (Selected Papers from ICEC2006))
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概要
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To realize highly conductive and wear-durable thin films, we deposited metal doped carbon films onto silicon substrates by RF sputtering method. The dopant metals were various precious metals and transition metals. The electrical conductivity and wear durability of the deposited films were evaluated. We have found that Ir doping especially increased the electrical conductivity for the given amount of dopant metal. The wear durability of Ir-doped carbon films did not deteriorate even below a 7 at.% Ir concentration, and the conductivity of 7 at.% Ir-doped carbon was twenty times that of a non-doped carbon thin film.
- 社団法人電子情報通信学会の論文
- 2007-07-01
著者
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HIRONO Shigeru
NTT Afty Engineering Corporation
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Hirono Shigeru
Ntt Afty Corporation
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Hirono Shigeru
Mes Afty Corp. Tokyo Jpn
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Hirono Shigeru
エム・イー・エス・アフティ株式会社
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UMEMURA Shigeru
Chiba Institute of Technology
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UMEMURA Shigeru
千葉工業大学
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MISU-MATSUHASHI Shinsuke
Chiba Institute of Technology
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Misu-matsuhashi Shinsuke
Chiba Institute Of Technology:(present Office)sumitomo Construction Machinery Manufacturing Co. Ltd.
関連論文
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- Nanometer-Scale Recording on a Superhard and Conductive Carbon Film Using an Atomic Force Microscope
- Electrical and Mechanical Characteristics of Co-Doped and Ni-Doped Carbon Thin Films
- Electrical and Tribological Characteristics of Metal-Doped Carbon Thin Films(Materials,Recent Development of Electromechanical Devices (Selected Papers from ICEC2006))
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- FOREWORD
- Nanometer-Scale Recording on a Superhard and Conductive Carbon Film Using an Atomic Force Microscope
- Field-Effect Transistor with Deposited Graphite Thin Film