OS2-18 太陽電池製膜用高生産性プラズマCVD装置の開発(OS2 自然エネルギー,循環型社会における動力エネルギー技術)

概要

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In our company, thin film type photovoltaic have been developed as part of development and utilization of the source of clean energy. The high-speed large area plasma CVD (Chemical Vapor Deposition) technical development which used extremely high frequency for the reduction in cost is tackled, the amorphous silicon solar cell (1.4mx1.1m) of largest-in-the-world size is already put in practical use as the result, and it mainly sells in the oversea market. Moreover, the amorphous silicon/micro crystalline silicon tandem type solar cell development which aimed at 12% of power generation efficiency based on this technology for product competitive power strengthening are performed. By developing the electrode composition suitable for the film made from the micro crystalline Si, and electric supply technology, while establishing the film technology made from large area high speed of fine crystal silicone, the efficient-ized technology grasped by the basic examination also in respect of a performance was applied, and the prospect of the power generation efficiency exceeding 11% was obtained. In response to this result, the production factory of the 40MW of the present yearly outputs is under construction.
社団法人日本機械学会の論文
2007-06-13