CVRD(Chemical Vapor Reductive Deposition)法による機能性薄膜の特性向上

概要

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Deposition of metallic nanoparticles such as Pt, Pd or Ni on titania has been considerably investigated in order to enhance the photocatalytic reduction activity. Although there are a number of reports on the deposition onto titania particles, few studies focusing on the deposition onto titania film have been reported. On the other hand, we have already developed Liquid Phase Reductive Deposition method as a technique to prepare uniformly-sized metallic nanoparticles on metal oxide fine particles in the liquid phase. Here we describe a novel preparation method, Chemical Vapor Reductive Deposition method, to obtain metallic nanoparticles with a well-controlled uniform size on a film-type substrate. This process was based on adsorption of metal precursor, being reduced to metal, heterogeneous nucleation and subsequent particle growth on the substrate surface. As a result of AFM of titania alone and Ni/titania, Ni nanoparticles with a uniform size of ca. 20nm were successfully deposited. UV-vis transmittance spectra of the two photocatalyst films were almost the same, disturbance of supported Ni nanoparticles to the absorption of titania was negligible and then Ni would behave as active sites for reduction.報文Original Paper
東北大学の論文