Diamond Deposition on a Large-Area Substrate by Plasma-Assisted Chemical Vapor Deposition Using an Antenna-Type Coaxial Microwave Plasma Generator : Nuclear Science, Plasmas, Electric Dischanges
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概要
- 論文の詳細を見る
Diamond deposition on a large area silicon wafer substrate (φ100 mm) is achieved with a methane/hydrogen plasma induced by an antenna-type coaxial microwave plasma generator. Deposition of diamond is observed over the entire substrate. Diamond precursors are emitted radially onto a silicon substrate from the plasma sphere generated at the tip of the antenna. The possibility of diamond deposition outside the plasma sphere is discussed using a semi-empirical equation.
- 社団法人応用物理学会の論文
- 2001-07-01
著者
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KAWARADA Hiroshi
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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Kudo Minoru
Micro Denshi Co. Ltd.
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Kawarada Hiroshi
Department Of Electronics Information And Communication Engineering Waseda University:crest Japan Sc
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Matsumoto Osamu
Department Of Urology Miki City Hospital
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TANIYAMA Norikazu
Micro Denshi Co., Ltd.
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Matsumoto Osamu
Department Of Chemistry Aoyama Gakuin University
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Taniyama Norikazu
Micro Denshi Co. Ltd.
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