イオン注入法によるFe及びCu超微粒子形成とGMR特性(<特集>第17回「電磁力関連のダイナミクス」シンポジウム)

概要

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The formation of iron and cupper nano-clusters in crystalline SiO_2 by ion implantation is studied. The implantation of ^<57>Fe and Cu ions was performed at room temperature up to a total dose of 1.9×10^<17> ions/cm^2 with projectiles energy of 74 keV and 80 keV, respectively. It is shown by the measurements of conversion electron Mossbauer spectroscopy (CEMS) and glancing angle X-ray diffraction (GXRD) that Si atoms are dissolved into the precipitated iron nano-clusters in the Fe/SiO_2. Moreover, the implantation of Fe ions formed the iron nano-clusters precipitates rapidly and effectively in SiO_2 matrix. Furthermore, it is indicated that the addition of Cu ions into Fe/SiO_2 promotes the transition from superparamagnetic to ferromagnetic states, suggesting the formation of metastable Fe-Cu alloy nano-clusters.
日本AEM学会の論文
2006-03-10