エアロゾルデポジション法による緻密イットリア膜の室温形成

概要

論文の詳細を見る
Dense yttrium oxide film was prepared by aerosol deposition process at room temperature. The deposition rate was very high〜60μm/h. The thickness of the films were 25μm and 10μm on aluminum alloy and quartz substrates, respectively. Transmission electron microscopy showed that the film was highly dense without voids and had a homogeneous interface between the layer and the quartz substrate used. The film was composed of randomly oriented Y_2O_3 crystallites of size less than 20 nm. The film (2μm thick) had a 55-85% transmittance in the region 250-800 nm. Electrical and mechanical properties of the film were examined. The volume resistivity of the film was 10^<14> Ω・cm. The adhesion force of the interface between the Y_2O_3 layer and the substrate was 59 MPa.
社団法人日本セラミックス協会の論文
2006-03-01