Preparation of Pb(Zr, Ti)O_3 Thin Films on Glass Substrates
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-09-30
著者
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AKIYAMA Masahiko
Display Materials and Devices Laboratories, Research and Development Center, Toshiba Corporation
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Hioki Tsuyoshi
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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SUZUKI Kouji
Display Materials and Devices Laboratory, Corporate Research and Development Center, Toshiba Corpora
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Akiyama Masahiko
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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Onozuka Yutaka
Display Materials and Devices Laboratory, Corporate Research & Development Center, Toshiba Corp.
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Ueda Tomomasa
Display Materials and Devices Laboratory, Corporate Research & Development Center, Toshiba Corp.
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Hara Yujiro
Display Materials and Devices Laboratory, Corporate Research & Development Center, Toshiba Corp.
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Hiromasu Y
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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Ueda Tomomasa
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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Onozuka Yutaka
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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Akiyama Masahiko
Display Materials And Devices Laboratories Research And Development Center Toshiba Corporation
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Suzuki Kouji
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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Hara Yujiro
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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- Preparation of Pb(Zr, Ti)O_3 Thin Films on Glass Substrates
- Preparation of Pb(Zr, Ti)O_3 Thin Films by Plasma-Assisted Sputtering
- Photolithographic Pattern Transformation by Backside Exposure in a-Si:H Thin-Film Transistor Liquid Crystal Displays