Ueda Tomomasa | Display Materials and Devices Laboratory, Corporate Research & Development Center, Toshiba Corp.
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概要
- 同名の論文著者
- Display Materials and Devices Laboratory, Corporate Research & Development Center, Toshiba Corp.の論文著者
関連著者
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AKIYAMA Masahiko
Display Materials and Devices Laboratories, Research and Development Center, Toshiba Corporation
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Hioki Tsuyoshi
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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SUZUKI Kouji
Display Materials and Devices Laboratory, Corporate Research and Development Center, Toshiba Corpora
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Akiyama Masahiko
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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Onozuka Yutaka
Display Materials and Devices Laboratory, Corporate Research & Development Center, Toshiba Corp.
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Ueda Tomomasa
Display Materials and Devices Laboratory, Corporate Research & Development Center, Toshiba Corp.
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Ueda Tomomasa
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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Onozuka Yutaka
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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Akiyama Masahiko
Display Materials And Devices Laboratories Research And Development Center Toshiba Corporation
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Suzuki Kouji
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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Hara Yujiro
Display Materials and Devices Laboratory, Corporate Research & Development Center, Toshiba Corp.
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Hiromasu Y
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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Hara Yujiro
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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Hasegawa Ray
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
著作論文
- 2.4 An Image-Memory LCD using Ferroelectric Film Formed on Glass Substrate by a Novel ICP-Assisted Sputtering Method(Session2 NOVEL LC DEVELOPMENT)(Report on 20^ International Display Research Conference)
- Preparation of Pb(Zr, Ti)O_3 Thin Films on Glass Substrates
- Preparation of Pb(Zr, Ti)O_3 Thin Films by Plasma-Assisted Sputtering