Preparation of Pb(Zr, Ti)O_3 Thin Films by Plasma-Assisted Sputtering
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概要
- 論文の詳細を見る
A novel plasma-assisted RE magnetron sputtering system with an immersed coil antenna between a target and a substrate was applied for preparing Pb (Zr, Ti)O_3 (PZT) thin films. The antenna enabled the generation of inductively coupled plasma (ICP) independently of the target RF source. The plasma assisted by the antenna resulted in the changes of ion fluxes and these energy distributions irradiating to the substrate. The crystalline phase of the deposited PZT thin films was occupied by the perovskite phase depending on the antenna power. In addition, a high deposition rate, modified uniformity of film thickness, and a dense film structure with large columnar grains were obtained as a result of effects of the assisted plasma. The application of the plasma-assisted sputtering method may enable the preparation of PZT thin films that have excellent properties.
- 社団法人応用物理学会の論文
- 1999-09-30
著者
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AKIYAMA Masahiko
Display Materials and Devices Laboratories, Research and Development Center, Toshiba Corporation
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Hioki Tsuyoshi
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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SUZUKI Kouji
Display Materials and Devices Laboratory, Corporate Research and Development Center, Toshiba Corpora
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Akiyama Masahiko
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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Onozuka Yutaka
Display Materials and Devices Laboratory, Corporate Research & Development Center, Toshiba Corp.
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Ueda Tomomasa
Display Materials and Devices Laboratory, Corporate Research & Development Center, Toshiba Corp.
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Ueda Tomomasa
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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Onozuka Yutaka
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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Akiyama Masahiko
Display Materials And Devices Laboratories Research And Development Center Toshiba Corporation
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Suzuki Kouji
Display Materials And Devices Laboratory Corporate Research & Development Center Toshiba Corp.
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