Internal Stress and Thermal Expansion Coefficient of GDa-Si Films

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1981-01-05

著者

• Miyagi Masami

  Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation

• FUNAKOSHI Nobuhiro

  Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation

• Funakoshi Nobuhiro

  Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation

関連論文

• Pattern Size Dependence of Sensitivity of Inorganic SeGe/Ag Resist
• Anomalous Ag Surface Diffusion in Amorphous Se-Ge/Ag Inorganic Resist
• Internal Stress and Thermal Expansion Coefficient of GDa-Si Films
• The Origin of the Composition Variation of Amorphous Gd-Co Films Prepared by rf-Bias-Sputtering
• Thermal Behavior and Crystallization Kinetics of Amorphous PdSi Alloys
• The Crystallization Kinetics of Amorphous Pd_Ag_4Si_
• The Compositional Dependence of the Crystallization Temperature in Amorphous Co-Si-B Alloys
• Composition Control of dc-Sputtered Amorphous Gd-Co Magnetic Thin Films
• Authors' Reply to Comment on "Anomalous Ag Surface Diffusion in Amorphous Se-Ge/Ag Inorganic Resist"
• The Crystallization Kinetics of Amorphous PdAgSi Alloys
• Liquid Quenching of Pd_Ag_xSi_ Alloys

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