Epitaxial Growth of NbN Thin Films at Room Temperature by Ion-Beam Sputtering Deposition

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1981-05-05

著者

• Takei Koji

  Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation

• NAGAI Kazutoshi

  Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation

• Nagai Kazutoshi

  Ibaraki Electrical Communication Laboratory

関連論文

• NbN/Nb Josephson Junction with a Plasma Oxidized Barrier
• Fabrication of High Quality NbN/Pb Josephson Tunnel Junctions with Plasma Oxidized Barriers
• Epitaxial Growth of NbN Thin Films at Room Temperature by Ion-Beam Sputtering Deposition
• Laser Annealing of Nb Films Prepared by Ion Beam Sputtering
• The Effect of Ion Bombardment on Carbon Films Prepared by Laser Evaporation
• Effects of Heat Treatment of CdS Single Crystals Examined by ESCA
• Growth of Craters on Ion Etched Surface of LiNbO_3 and Ion Etching without Craters
• Thinning of LiNbO_3 for Acousto-Optic Deflectors by Ion Etching

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