Growth of Craters on Ion Etched Surface of LiNbO_3 and Ion Etching without Craters
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概要
- 論文の詳細を見る
A LiNbO_3 single crystal for acousto-optic deflectors was etched by ion beam techniques. A number of craters were observed on a 15μm etched surface. It was found that they grew during ion etching with ions incident normal to the surface. Their average diameter was estimated to be 40μm and their average depth to be 1〜2μm. An explanation for the growth of the craters was proposed by taking account of the dependence of the etching rate on the localized angle of the incident ions. Experimental conditions under which a smooth surface can be obtained were discussed. The experimental results were in agreement with the theoretical prediction.
- 社団法人応用物理学会の論文
- 1972-11-05
著者
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Nagai Kazutoshi
Ibaraki Electrical Communication Laboratory
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Nagai Kazutoshi
Ibaraki Electrical Communication Laboratory N.t.t.
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YASUDA Hiroshi
Ibaraki Electrical Communication Laboratory, N.T.T.
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Yasuda Hiroshi
Ibaraki Electrical Communication Laboratory
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Yasuda Hiroshi
Ibaraki Electrical Communication Laboratory N.t.t.
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- Growth of Craters on Ion Etched Surface of LiNbO_3 and Ion Etching without Craters
- Thinning of LiNbO_3 for Acousto-Optic Deflectors by Ion Etching
- Figuration of Wedge-Shaped Surface by Ion Etching