Power GaAs MESFETs with a Graded Recess Structure : B-1: GaAs IC
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1980-04-30
著者
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Hasegawa Fumio
Central Research Laboratories Nippon Electric Co. Ltd.
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TAKAYAMA Yoichiro
Microelectronics Research Laboratories
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Higashisaka Asamitsu
Microelectronics Research Laboratories
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Higashisaka Asamitsu
Central Research Laboratories Nippon Electric Co. Ltd.
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FURUTSUKA Takashi
Microelectronics Research Laboratories
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FURUTSUKA Takashi
Central Research Laboratories, Nippon Electric Co., Ltd.
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AONO Yoichi
Central Research Laboratories, Nippon Electric Co., Ltd.
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TAKAYAMA Yoichiro
Central Research Laboratories, Nippon Electric Co., Ltd.
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Aono Yoichi
Central Research Laboratories Nippon Electric Co. Ltd.
関連論文
- MOCVD GaAlAs Hetero-Buffer GaAs Low-Noise MESFETs : B-5: GaAs IC
- Investigation on the Drift of GaAs MESFET's by High Frequency Parameters : B-2: GaAs FET/LED AND DETECTOR
- High-Speed E/D GaAs ICs with Closely-Spaced FET Electrodes : B-5: GaAs IC
- Power GaAs MESFETs with a Graded Recess Structure : B-1: GaAs IC
- Temperature Dependence of Gunn Effect in GaAs over the Range 77°K to 545°K
- Deep Energy Levels in the High Resistance Region at GaAs Vapor Epitaxial Film-Substrate Interface
- Cause of the High Pesistance Region at Vapour Epitaxial GaAs Layer-Substrate Interface
- Occurrence of a High Resistance Layer in GaAs Substrate through Vapor Epitaxial Process
- Occurrence of a High Resistance Layer at Vapor Epitaxial GaAs Film-Substrate Interface
- Impurity Transfer in GaAs Vapor Growth and Carrier-Concentration Profiles of the Grown Films