Profile Control and Plasma Rotation by Biased Electrodes in Large Diameter RF Produced Plasma
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概要
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Control of the plasma profile has been carried out using three types of biased electrodes in a large-diameter (45 cm), radio-frequency (RF)-produced plasma with a magnetic field in the low-pressure region. The radial profile of the electron density changed from a hollow to a peaked one, while the electron temperature distribution did not appreciably change. The azimuthal rotation velocity was changed with this biasing. It decreased with a lower magnetic field and/or in a high-pressure regime, and a localized velocity profile near the edge region was obtained with a few kHz oscillation of the ion saturation current.
- 社団法人応用物理学会の論文
- 1999-07-30
著者
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Shinohara Shunjiro
Interdisciplinary Graduate School Of Engineering Science Kyushu University
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Shinohara Shunjiro
Interdisiplinary Graduate School Of Engineering Sciences Kyushu University
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Matsuoka Norikazu
Interdisiplinary Graduate School of Engineering, Sciences, Kyushu University
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Yoshinaka Toshiro
Interdisiplinary Graduate School of Engineering, Sciences, Kyushu University
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Matsuoka Norikazu
Interdisiplinary Graduate School Of Engineering Sciences Kyushu University
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Yoshinaka Toshiro
Interdisiplinary Graduate School Of Engineering Sciences Kyushu University
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