Sub-Micron Pattern Control Technology for Variable-Shaped EB Lithography : A-5: PROCESS TECHNOLOGY

スポンサーリンク

概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1983-02-28

著者

• MORI Katsumi

  Fundamental Research Laboratories, NEC Corporation

• SUZUKI Katsumi

  Microelectronics Research Laboratories, NEC Corporation

• Iida Yasuo

  Microelectronics Research Laboratories

• Hasegawa Shinya

  Microelectronics Research Laboratories

• Mori Katsumi

  Fundamental Research Laboratories

関連論文

• FIB Exposure Characteristics of LB Film
• Ultrahigh-Vacuum Electron Cyclotron Resonance-Plasma Chemical-Vapor-Deposited SiN_x Films for X-Ray Lithography Mask Membrane : As-Deposited Properties and Radiation Stability
• A Highly Stable Al-Si Contact to Mo-Silicided Shallow Junctions
• Model for Al Etch-Rate Enhancement at Low Temperatures
• Sub-Micron Pattern Control Technology for Variable-Shaped EB Lithography : A-5: PROCESS TECHNOLOGY
• Bi-Level Structures for Focused Ion Beam Using Maskless Ion Etching
• New Selective Deposition Technology by Electron Beam Induced Surface Reaction

スポンサーリンク