Sputtered Lead Silicate Glass Film for Multilevel Interconnections : A-5: PROCESS TECHNOLOGY

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1983-02-28

著者

• Kato Kinya

  Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation

• Kato Kinya

  Musashino Electrical Communication Laboratory

• SHUTO Keizo

  Musashino Electrical Communication Laboratory

• HASEGAWA Masahiko

  Musashino Electrical Communication Laboratory

関連論文

• Sputtered Lead Silicate Glass Film for Multilevel Interconnections : A-5: PROCESS TECHNOLOGY
• Optimum B^+ Dose in S/D Regions to Improve Schottky p-Channel MOSFET Characteristics
• Improvement of Schottky MOSFET Characteristics by B^+ Implantation in Active Region
• Field-Induction-Drain Thin-Film Transistors for Liquid-Crystal Display Applications : Liquid Crystal Display
• Field-Induction-Drain Thin-Film Transistors for Liquid-Crystal Display Applications
• Characteristics of Field-Induction-Drain (FID) Amorphous-Silicon Thin-Film Transistors
• Observation of Ferroelectricity in Very Thin Vinylidene Fluoride Trifluoroethylene Copolymer[P(VDF・TrFE)] Films by High Frequency C-V Measurements of Al-SiO_2-P(VDF・TrFE)-SiO_2-Si Capacitors
• Observation of B-H Hysteresis Loop of Yb-Orthoferrite by Faraday Rotation

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